Characterization of silicon native oxide formed in SC-1, H2O2 and wet ozone processes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 A, 1997, Pages 5507-5513

  Ohwaki, Takeshi ^a   Takeda, Mikako ^a   Takai, Yoshizo ^b  

^a KOBE STEEL LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Attenuated total reflection spectroscopy; Effective medium theory; Infrared spectroscopy; Silicon native oxide; Transmission electron microscopy; Wet ozone cleaning; X ray photoelectron spectroscopy

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDES; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATTENUATED TOTAL REFLECTION SPECTROSCOPY; EFFECTIVE MEDIUM THEORY; SILICON NATIVE OXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031220680     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5507     Document Type: Article

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