X-ray induced mask contamination and particulate monitoring in x-ray steppers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4336-4340

  Capasso, C ^a   Pomerene, A ^b   Chu, W ^a   Leavey, J ^b   Lamberti, A ^b   Hector, S ^a   Oberschmidt, J ^b   Pol, V ^a  

^a MOTOROLA INC   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005148249     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589048     Document Type: Article

References (13)

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