X-ray mask fabrication advancements at the microlithographic mask development center

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2723, Issue , 1996, Pages 190-197

  Kimmel, Kurt R ^a   Hughes, Patrick J ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Microlithographic Development Center; MMD; X ray lithography; X ray mask

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTROPLATING; GOLD; MASKS; MICROELECTRONICS; STATIC RANDOM ACCESS STORAGE; X RAYS;

X-RAY MASKS;

X RAY LITHOGRAPHY;

EID: 0030314699     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240470     Document Type: Conference Paper

References (5)

1. Performance of IBM's EL-4 E-beam lithography system
2. Overlay enhancement with product-specific emulation in electron-beam lithography tools
3. Improvement of pattern and position accuracies by multiple electron beam writing for X-ray mask fabrication
4. Sputtering of fibrous-structured low-stress Ta films for x-ray masks
5. X-ray mask development based on SiC membrane and W absorber