Comparison between optical proximity effect of positive and negative tone patterns in KrF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 739-750

  Fujimoto, Masashi ^a   Hashimoto, Takeo ^a   Uchiyama, Takayuki ^a   Matsuura, Seiji ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; PHASE SHIFT; PROXIMITY SENSORS;

KRYPTON FLUORIDE; OPTICAL MICROLITHOGRAPHY; OPTICAL PROXIMITY EFFECT;

PHOTOLITHOGRAPHY;

EID: 0031338623     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275991     Document Type: Conference Paper

References (21)