ArF chemically amplified negative resist using alicyclic epoxy polymer

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 507-512

  Maeda, Katsumi ^a   Iwasa, Shigeyuki ^a   Nakano, Kaichiro ^a   Hasegawa, Etsuo ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Alicyclic polymer; Arf excimer laser lithography; Chemically amplified negative resist; Epoxy group

Indexed keywords

EID: 0007556375     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.507     Document Type: Article

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