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Volumn 148, Issue 7, 2001, Pages

Effect of Carrier Gas on Chemical Vapor Deposition of Copper with (Hexafluoroacetylacetonate)Cu(I)(3,3-Dimethyl-1-butene)

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000073161     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1375168     Document Type: Article
Times cited : (17)

References (24)
  • 24
    • 0442323054 scopus 로고    scopus 로고
    • M. D. Allendorf and M. L. Hitchman, Editors, PV 2000-13, The Electrochemical Society Proceedings Series, Pennington, NJ
    • K. K. Choi and S. W. Rhee, in Chemical Vapor Deposition XV, M. D. Allendorf and M. L. Hitchman, Editors, PV 2000-13, p. 505, The Electrochemical Society Proceedings Series, Pennington, NJ (2000).
    • (2000) Chemical Vapor Deposition XV , pp. 505
    • Choi, K.K.1    Rhee, S.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.