CVD growth of Cu films using H2 as carrier gas

Journal of Electronic Materials

Volumn 28, Issue 5, 1999, Pages 567-571

  Lin, Pi Jiun ^a   Chen, Mao Chieh ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRIC CONDUCTIVITY; HYDROGEN; METALLOGRAPHIC MICROSTRUCTURE; NITROGEN; PLASMA APPLICATIONS; SILANES; SUBSTRATES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CARRIER GAS; COLD WALL VERTICAL REACTOR; COPPER FILMS;

METALLIC FILMS;

EID: 0032640589     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-999-0114-y     Document Type: Article

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