Dependence of the photoemission of amorphous silicon nitride thin films on their composition

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 268-271

  Compagnini, G ^a   Galati, C ^b   Miliani, C ^c   Cataliotti, R S ^c  

^a UNIVERSITY OF CATANIA   (Italy)

^b STMICROELECTRONICS   (Italy)

^c UNIVERSITY OF PERUGIA   (Italy)

Author keywords

Photoluminescence; Silicon nitrides; Thin films

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; HYDROGEN BONDS; HYDROGENATION; PHOTOEMISSION; PHOTOLUMINESCENCE; SILICON NITRIDE;

BOND SATURATION;

THIN FILMS;

CHEMICAL COMPOSITION; FILM; SILICON NITRIDE;

EID: 0036494899     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01568-7     Document Type: Article

References (8)