Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation

Journal of Colloid and Interface Science

Volumn 282, Issue 1, 2005, Pages 241-247

  Jung, Yu Jin ^a   Kim, Jung Im ^a   Kang, Tai Hee ^a   Ihm, Kyuwook ^a   Kim, Ki Jeong ^a   Kim, Bongsoo ^a   Park, Joon Won ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

AFM image; Benzaldimine monolayer; Fluorescence image; Near edge X ray absorption fine structure (NEXAFS) spectroscopy; Pattern; Soft X ray; X ray photoelectron spectra (XPS)

Indexed keywords

BENZALDIMINE MONOLAYERS; CHEMICAL TRANSFORMATIONS; SURFACE TOPOLOGY;

AMINES; ATOMIC FORCE MICROSCOPY; FLUORESCENCE; IRRADIATION; MOLECULES; RADIATION; SURFACES; TOPOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

MONOLAYERS;

BIOTIN; IMINE; STREPTAVIDIN;

ARTICLE; FLUORESCENCE; PRIORITY JOURNAL; ROENTGEN SPECTROSCOPY; X IRRADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

IMINES; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; SPECTRUM ANALYSIS; SURFACE PROPERTIES; X-RAYS;

EID: 9644290736     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.08.120     Document Type: Article

References (31)

1. A. Ulman Chem. Rev. 96 1996 1533
2. F. Hide, A.M. Díaz-García, B.J. Schwartz, M.R. Andersson, Q. Pei, and A.J. Heeger Science 273 1996 1833
3. For recent reviews on combinatorial synthesis, see Chem. Rev. 97 2 1997 347
4. A. Goffeau Nature 385 1997 202
5. H.-J. Galla Angew. Chem. Int. Ed. Engl. 31 1992 45
6. S. Okazaki J. Vac. Sci. Technol. B 9 1991 2829
7. H.N. Chapman, A.K. Ray-Chavdhuri, D.A. Ticher, W.C. Replogle, R.H. Stulen, G.D. Kubiak, P.D. Rockett, L.E. Klebanoff, D. O'Connell, A.H. Leung, K.L. Jefferson, J.B. Wronosky, J.S. Tayer, L.C. Hale, K. Blaedel, E.A. Spiller, G.E. Sommargren, J.A. Folta, D.W. Sweeney, E.M. Gullikson, P. Naulleau, K.A. Goldberg, J. Boker, D.T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, C.W. Gwyn, and S.H. Lee J. Vac. Sci. Technol. B 19 6 2001 2389
8. A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith J. Vac. Sci. Technol. B 8 6 1990 1648
9. S. Facsko, T. Dekorsy, C. Koerdt, C. Trappe, H. Kurz, A. Vogt, and H.L. Hartnagel Science 285 1999 1551
10. A. Hatzer, and P.S. Weiss Science 291 2001 1019
11. R. Hild, C. David, H.U. Müller, B. Völkel, D.R. Kayser, and M. Grunze Langmuir 14 1998 342
12. W. Geyer, V. Stadler, W. Eck, M. Zharnikov, A. Gölzhäuser, and M. Grunze Appl. Phys. Lett. 75 1999 2401
13. W. Eck, V. Stadler, W. Geyer, M. Zharnikov, A. Gölzhäuser, and M. Grunze Adv. Mater. 12 2000 805
14. L.E. Harriott J. Vac. Sci. Technol. B 15 6 1997 2130
15. Y.-H. La, H.J. Kim, I.S. Maeng, Y.J. Jung, T.-H. Kang, K.-J. Kim, B. Kim, and J.W. Park Langmuir 18 2002 2430
16. Y.-H. La, H.J. Kim, I.S. Maeng, Y.J. Jung, T.-H. Kang, K.-J. Kim, K. Ihm, B. Kim, and J.W. Park Langmuir 18 2002 301
17. J.H. Moon, Y.-H. La, J.Y. Shim, B.J. Hong, K.-J. Kim, T.-H. Kang, B. Kim, H. Kang, and J.W. Park Langmuir 16 2000 2981
18. J.H. Moon, K.-J. Kim, T.-H. Kang, B. Kim, H. Kang, and J.W. Park Langmuir 14 1998 5673
19. Y.-H. La, Y.J. Jung, H.J. Kim, T.-H. Kang, K.-J. Kim, K. Ihm, B. Kim, and J.W. Park Langmuir 19 2003 4390
20. Y.-H. La, Y.J. Jung, T.-H. Kang, K.-J. Kim, K. Ihm, B. Kim, and J.W. Park Langmuir 19 2003 9984
21. L. Merhari, K.E. Gonsalves, Y. Hu, W. He, W.-S. Huang, M. Angelopoulos, W.H. Bruenger, C. Dzionk, and M. Torkler Microelectron. Eng. 63 2002 291 403
22. P. Jedrasik Microelectron. Eng. 27 1995 191
23. Y. Xia, and G.M. Whitesides Angew. Chem. Int. Ed. 37 1998 551
24. S.-Y. Rah, T.-H. Kang, Y. Chung, B. Kim, and K.-B. Lee Rev. Sci. Instrum. 66 1995 1751
25. J. Stöhr NEXAFS Spectroscopy Springer Series in Surface Sciences vol. 25 1992 Springer-Verlag Berlin
26. J.G. Chen Surf. Sci. Rep. 30 1997 1
27. J.H. Moon, J.H. Kim, K.-J. Kim, T.-H. Kang, B. Kim, C.-H. Kim, J.H. Hahn, and J.W. Park Langmuir 13 1997 4305
28. J.H. Moon, J.W. Shin, S.Y. Kim, and J.W. Park Langmuir 12 1996 4621
29. H.J. Kim, J.H. Moon, and J.W. Park J. Colloid Interface Sci. 227 2000 247
30. T. Koyano, M. Saito, Y. Miyamoto, K. Kaifu, and M. Kato Biotechnol. Prog. 12 1996 141
31. Y.J. Jung, Y.-H. La, H.J. Kim, T.-H. Kang, K.-J. Kim, K. Ihm, B. Kim, and J.W. Park Langmuir 19 2003 4512