Absolute surface density of the amine group of the aminosilylated thin layers: Ultraviolet-visible spectroscopy, second harmonic generation, and synchrotron-radiation photoelectron spectroscopy study

Langmuir

Volumn 13, Issue 16, 1997, Pages 4305-4310

  Moon, Joong Ho ^a   Kim, Jin Ho ^a   Kim, Ki Jeong ^a   Kang, Tai Hee ^a   Kim, Bongsoo ^a   Kim, Chan Ho ^a,b   Hahn, Jong Hoon ^a   Park, Joon Won ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Sangji University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; FUSED SILICA; MORPHOLOGY; SECOND HARMONIC GENERATION; SILANES; SILICON WAFERS; SURFACE STRUCTURE; SURFACE TREATMENT; SYNCHROTRON RADIATION; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMINOSILYLATION;

MONOLAYERS;

EID: 0031556159     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9705118     Document Type: Article

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