Formation of uniform aminosilane thin layers: An imine formation to measure relative surface density of the amine group

Langmuir

Volumn 12, Issue 20, 1996, Pages 4621-4624

  Moon, Joong Ho ^a   Shin, Ji Won ^a   Kim, Sang Youl ^a,b   Park, Joon Won ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Ajou University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001381024     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9604339     Document Type: Article

References (44)

1. (a) Plueddemann, E. P. Silane Coupling Agents; Plenum: New York, 1991.
2. (b) Ulman A. An Introduction to Ultrathin Organic Films from Langmuir-Blodgett to Self-Assembly; Academic: New York, 1991.
3. (c) Folkers, J. P.; Zerkowski, J. A.; Laibinis, P. E.; Seto, C.; Whitesides, G. M. In Supramolecular Architecture; Bein, T., Ed.; ACS Symposium Series 499; American Chemical Society: Washington, DC, 1992.
4. (d) Tredgold, R. H. Order in Thin Organic Films; Cambridge University: Cambridge, 1994.
5. (a) Decher, G.; Hong, J. D.; Schmit, J. Thin Solid Films 1992, 211, 831.
6. (b) Decher, G.; Hong, J. D. Makromol. Chem., Makromol. Symp. 1991, 46, 321-327.
7. (c) Decher, G.; Hong, J. D. Ber. Bunsenges. Phys. Chem. 1991, 95, 1430-1434.
8. (d) Saremi, F.; Tieke, B. Adv. Mater. 1995, 7, 378-380.
9. (a) Choi, J. U.; Lim, C. B.; Kim, J. H.; Chung, T. Y.; Moon, J. H.; Hahn, J. H.; Kim, S. B.; Park, J. W. Synth. Met. 1995, 71, 1729-1730.
10. (b) Moon, J. H.; Choi, J. U.; Kim, J. H.; Chung, H.; Hahn, J. H.; Kim, S. B.; Park, J. W. J. Mater. Chem. 1996, 6, 365-368.
11. (c)Zhang, X.-Q.; You, X.-Z.; Ma, S.-H.; Wei, Y. J. Mater. Chem. 1995, 5, 643-647.
12. For self-assembled NLO multilayers see: (a) Lin, W.; Yitzchaik, S.; Lin, W.; Malik, A.; Durbin, M. K.; Richter, A. G.; Wong, G. K.; Dutta, P.; Marks, T. J. Angew. Chem., Int. Ed. Engl. 1995, 34, 1497-1499. (b) Roscoe, S. B.; Yitzchaik, S.; Kakkar, A. K.; Marks, T. J.; Lin, W.; Wong, G. K. Langmuir 1994, 10, 1337. (c) Yitzchaik, S.; Kakkar, A. K.; Orihashi, Y.; Marks, T. J.; Lin, W.; Wong, G. K. Mol. Cryst. Liq. Cryst. 1994, 240, 9. (d) Yitzchaik, S.; Roscoe, S. B.; Kakkar, A. K.; Allan, D. S.; Marks, T. J.; Xu, Z.; Zhang, T.; Lin, W.; Wong, G. K. J. Phys. Chem. 1993, 97, 6958. (e) Li, D.; Ratner, M. A.; Marks, T. J. J. Am. Chem. Soc. 1990, 112, 7389.
13. For self-assembled NLO multilayers see: (a) Lin, W.; Yitzchaik, S.; Lin, W.; Malik, A.; Durbin, M. K.; Richter, A. G.; Wong, G. K.; Dutta, P.; Marks, T. J. Angew. Chem., Int. Ed. Engl. 1995, 34, 1497-1499. (b) Roscoe, S. B.; Yitzchaik, S.; Kakkar, A. K.; Marks, T. J.; Lin, W.; Wong, G. K. Langmuir 1994, 10, 1337. (c) Yitzchaik, S.; Kakkar, A. K.; Orihashi, Y.; Marks, T. J.; Lin, W.; Wong, G. K. Mol. Cryst. Liq. Cryst. 1994, 240, 9. (d) Yitzchaik, S.; Roscoe, S. B.; Kakkar, A. K.; Allan, D. S.; Marks, T. J.; Xu, Z.; Zhang, T.; Lin, W.; Wong, G. K. J. Phys. Chem. 1993, 97, 6958. (e) Li, D.; Ratner, M. A.; Marks, T. J. J. Am. Chem. Soc. 1990, 112, 7389.
14. For self-assembled NLO multilayers see: (a) Lin, W.; Yitzchaik, S.; Lin, W.; Malik, A.; Durbin, M. K.; Richter, A. G.; Wong, G. K.; Dutta, P.; Marks, T. J. Angew. Chem., Int. Ed. Engl. 1995, 34, 1497-1499. (b) Roscoe, S. B.; Yitzchaik, S.; Kakkar, A. K.; Marks, T. J.; Lin, W.; Wong, G. K. Langmuir 1994, 10, 1337. (c) Yitzchaik, S.; Kakkar, A. K.; Orihashi, Y.; Marks, T. J.; Lin, W.; Wong, G. K. Mol. Cryst. Liq. Cryst. 1994, 240, 9. (d) Yitzchaik, S.; Roscoe, S. B.; Kakkar, A. K.; Allan, D. S.; Marks, T. J.; Xu, Z.; Zhang, T.; Lin, W.; Wong, G. K. J. Phys. Chem. 1993, 97, 6958. (e) Li, D.; Ratner, M. A.; Marks, T. J. J. Am. Chem. Soc. 1990, 112, 7389.
15. For self-assembled NLO multilayers see: (a) Lin, W.; Yitzchaik, S.; Lin, W.; Malik, A.; Durbin, M. K.; Richter, A. G.; Wong, G. K.; Dutta, P.; Marks, T. J. Angew. Chem., Int. Ed. Engl. 1995, 34, 1497-1499. (b) Roscoe, S. B.; Yitzchaik, S.; Kakkar, A. K.; Marks, T. J.; Lin, W.; Wong, G. K. Langmuir 1994, 10, 1337. (c) Yitzchaik, S.; Kakkar, A. K.; Orihashi, Y.; Marks, T. J.; Lin, W.; Wong, G. K. Mol. Cryst. Liq. Cryst. 1994, 240, 9. (d) Yitzchaik, S.; Roscoe, S. B.; Kakkar, A. K.; Allan, D. S.; Marks, T. J.; Xu, Z.; Zhang, T.; Lin, W.; Wong, G. K. J. Phys. Chem. 1993, 97, 6958. (e) Li, D.; Ratner, M. A.; Marks, T. J. J. Am. Chem. Soc. 1990, 112, 7389.
16. For self-assembled NLO multilayers see: (a) Lin, W.; Yitzchaik, S.; Lin, W.; Malik, A.; Durbin, M. K.; Richter, A. G.; Wong, G. K.; Dutta, P.; Marks, T. J. Angew. Chem., Int. Ed. Engl. 1995, 34, 1497-1499. (b) Roscoe, S. B.; Yitzchaik, S.; Kakkar, A. K.; Marks, T. J.; Lin, W.; Wong, G. K. Langmuir 1994, 10, 1337. (c) Yitzchaik, S.; Kakkar, A. K.; Orihashi, Y.; Marks, T. J.; Lin, W.; Wong, G. K. Mol. Cryst. Liq. Cryst. 1994, 240, 9. (d) Yitzchaik, S.; Roscoe, S. B.; Kakkar, A. K.; Allan, D. S.; Marks, T. J.; Xu, Z.; Zhang, T.; Lin, W.; Wong, G. K. J. Phys. Chem. 1993, 97, 6958. (e) Li, D.; Ratner, M. A.; Marks, T. J. J. Am. Chem. Soc. 1990, 112, 7389.
17. Chen, K.; Caldwell, W. B.; Mirkin, C. A. J. Am. Chem. Soc. 1993, 115, 1193.
18. Zhang, X.; Gao, M.; Kong, X.; Sun, Y.; Shen, Y. J. Chem. Soc., Chem. Comm. 1994, 1055-1056.
19. Petrucci, M. G.; Kakkar, A. K. J. Chem. Soc., Chem. Commun. 1995, 1577-1578.
20. (a) Freeman, R. G.; Grabar, K. C.; Allison, K. J.; Bright, R. M.; Davis, J. A.; Guthrie, A. P.; Hommer, M. B.; Jackson, M. A.; Smith, P. C.; Walter, D. G.; Natan, M. J. Science 1995, 267, 1629-1632.
21. (b) Dunaway, D. J.; McCarley, R. L. Langmuir 1994, 10, 3598-3606.
22. (c) Gao, M.; Gao, M.; Zhang, X.; Yang, Y.; Yang, B.; Shen, J. J. Chem. Soc., Chem. Commun. 1994, 2777-2778.
23. (a) Kurth, D. G.; Bein, T. Langmuir 1993, 9, 2965-2973.
24. (b) Kurth, D. G.; Bein, T. Angew. Chem., Int. Ed. Engl. 1992, 31, 336-338.
25. (a) Kallury, K. M. R.; MacDonald, P.M.; Thompson, M. Langmuir 1994, 10, 492-499.
26. (b) Bierbaum, K.; Kinzler, M.; Wöll, Ch.; Grunze, M.; Hähner, G.; Heid, S.; Effenberger, F. Langmuir 1995, 11, 512-518.
27. Haller, I. J. Am. Chem. Soc. 1978, 100, 8050-8055.
28. (a) Britcher, L. G.; Kehoe, D. C.; Matisons, J. G.; Smart, R. St. C.; Swincer, A. G. Langmuir 1993, 9, 1609-1613.
29. (b) Blümel, J. J. Am. Chem. Soc. 1995, 117, 2112-2113.
30. (c) Dubois, L. H.; Zegarski, B. R. J. Am. Chem. Soc. 1993, 115, 1190-1191.
31. Emmons, W. D. J. Am. Chem. Soc. 1957, 79, 5739-5754.
32. Corriu, R. J. P.; Guerin, C. Adv. Organmet. Chem. 1982, 20, 265-312.
33. The distances between hydrogens of the amine group and oxygens are calculated, and averaged. The values for 1 and 2 are 7.2 and 6.6 Å, respectively.
34. max of the reagent 1 is 246 nm.
35. 2/mol.
36. (a) Li, D. Ph.D. Thesis, Northwestern University, 1990.
37. (b) Zhuravlev, L. T.; Kieselev, A. V. In Proceedings of the International Symposium on Surface Area Determination; Everett, D. H., Ottewill, R. H., Eds.; Butterworth: London, 1970; p 155.
38. (c) Zhuravlev, L. T. Langmuir 1987, 3, 316-318.
39. (a) Wolf, H.; Ringsdorf, H.; Delamarche, E.; Takami, T.; Kang, H.; Michel, B.; Gerber, Ch.; Jaschke, M.; Butt, H.-J.; Bamberg, E. J. Phys. Chem. 1995, 99, 7102-7107.
40. (b) Caldwell, W. B.; Campbell, D. J.; Chen, K.; Herr, B. R.; Mirkin, C. A.; Malik, A.; Burbin, M. K.; Dutta, P.; Huang, K. G. J. Am. Chem. Soc. 1995, 117, 6071-6082.
41. Use of the reaction for other purposes appears in (a) Zhang, X.-Q.; You, X.-Z.; Ma, S.-H.; Wei, Y. J. Mater. Chem. 1995, 5, 643-647. (b) Brüning, C.; Grobe, J. J. Chem. Soc., Chem. Commun. 1995, 2323-2324.
42. Use of the reaction for other purposes appears in (a) Zhang, X.-Q.; You, X.-Z.; Ma, S.-H.; Wei, Y. J. Mater. Chem. 1995, 5, 643-647. (b) Brüning, C.; Grobe, J. J. Chem. Soc., Chem. Commun. 1995, 2323-2324.
43. 2.
44. The measurable maximal density might be limited by the volume of the imines.