Imaging at the picoscale

Materials Today

Volumn 7, Issue 12, 2004, Pages 42-48

  Bleloch, Andrew ^a   Lupini, Andrew ^b  

^a SUPERSTEM LABORATORY   (United Kingdom)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON ENERGY LOSS SPECTROSCOPY; IMAGING SYSTEMS; LENSES; MATERIALS SCIENCE; NICKEL COMPOUNDS; OPTICAL MICROSCOPY; OPTICAL SYSTEMS; SCANNING ELECTRON MICROSCOPY;

CHROMATIC ABERRATIONS; CONVENTIONAL TRANSMISSION ELECTRON MICROSCOPY (CTEM); SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM); SINGLE-ATOM SENSITIVITY;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 9544230698     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(04)00570-X     Document Type: Article

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