Precision fabrication techniques and analysis on high-Q evanescent-mode resonators and filters of different geometries

IEEE Transactions on Microwave Theory and Techniques

Volumn 52, Issue 11, 2004, Pages 2557-2566

  Gong, Xun ^a   Margomenos, Alexandras ^b   Liu, Bosui ^c,d   Hajela, Shloke ^c   Katehi, Linda P B ^c   Chappell, William J ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b EMAG Technologies Inc   (United States)

^c PURDUE UNIVERSITY   (United States)

^d KVH Industries Inc   (United States)

Author keywords

Cavity resonators; Evanescent mode filters; Periodic structure; Silicon micromachining; Stereolithography

Indexed keywords

BANDPASS FILTERS; CAPACITANCE; LITHOGRAPHY; MICROMACHINING; NATURAL FREQUENCIES; NOTCH FILTERS; RESONANCE; SILICON WAFERS; WAVE FILTERS; WAVEGUIDES;

EVANESCENT-MODE FILTERS; PERIODIC STRUCTURES; SILICON MICROMACHINING; STEREOLITHOGRAPHY;

CAVITY RESONATORS;

EID: 9244250325     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMTT.2004.837162     Document Type: Conference Paper

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