High-Q evanescent-mode filters using silicon micromachining and polymer stereolithography (SL) processing

IEEE MTT-S International Microwave Symposium Digest

Volumn 2, Issue , 2004, Pages 433-436

  Gong, Xun ^a   Margomenos, Alex ^b   Liu, Bosui ^c   Chappell, William J ^c   Katehi, Linda P B ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b EMAG Technologies Inc   (United States)

^c Purdue University   (United States)

Author keywords

Cavity resonators; Evanescent mode filters; Periodic structure; Silicon micromachining; Stereolithography (SL)

Indexed keywords

EVANESCENT-MODE FILTERS; HIGH-PERFORMANCE FILTERS; PERIODIC STRUCTURES; STEREOLITHOGRAPHY;

ELECTRIC FIELDS; INSERTION LOSSES; LITHOGRAPHY; MICROMACHINING; MICROSTRIP DEVICES; RESONATORS; SILICON;

ELECTRIC FILTERS;

EID: 4444347365     PISSN: 0149645X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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