Millimeter-wave annealing of SrBi2Ta2O9 films prepared by sol-gel method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 6286-6291

  Matsumoto, Takeshi ^a   Saito, Hidenori ^b   Numata, Ken ^b   Miyake, Shoji ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Kanagawa High Technology Foundation   (Japan)

Author keywords

Annealing; Ferroelectric random access memory; Millimeter wave; Sol gel; SrBi2Ta2O9

Indexed keywords

ANNEALING; CRYSTALLIZATION; ELECTRIC FURNACES; FERROELECTRIC MATERIALS; HEATING; MICROWAVES; SOL-GELS; THIN FILMS;

FERROELECTRIC RANDOM ACCESS MEMORY; MILLIMETER WAVE; RAPID THERMAL PROCESS (RTP); SRBI2TA2O3;

STRONTIUM COMPOUNDS;

EID: 9144258740     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6286     Document Type: Article

References (30)

1. R. Jimenez, C. Alemany, M. L. Calzada, P. Tejedor and J. Mendiola: J. Eur. Ceram. Soc. 21 (2001) 1601.
2. C. W. Chung and I. Chung: Thin Solid Films 354 (1999) 111.
3. A. Li, D. Wu, H. Ling, T. Yu, M. Wang, X. Yin, Z. Liu and N. Ming: J. Appl. Phys. 88 (2000) 1035.
4. T. Osaka, T. Yoshie, T. Hoshika, I. Koiwa, T. Sawada and A. Hashimoto: Jpn. J. Appl. Phys. 39 (2000) 5476.
5. C. E. Zybill. H. Boubekeur, Bi. Li, F. Koch, G. Schindler and C. Dehm: Thin Solid Films 386 (2001) 59.
6. I. Koiwa, T. Kanehara, J. Mita, T. Iwabuchi, T. Osaka, S. Ono and M. Maeda: Jpn. J. Appl. Phys. 35 (1996) 4946.
7. M. Mitsuya, N. Nukaga, T. Watanabe, H. Funakubo and K. Saito: Jpn. J. Appl. Phys. 40 (2001) L758.
8. J. F. Roeder, B. C. Hendrix, F. Hintermaier, D. A. Desrochers, T. H. Baum, G. Bhandari, M. Chappuis, P. C. Van Buskirk, C. Dehm, E. Fritsch, N. Nagel, H. Wendt, H. Cerva, W. Honlein and C. Mazuré: J. Eur. Ceram. Soc. 19 (1999) 1463.
9. N. J. Seong, C. H. Yang, W. C. Shin and S. G. Yoon: Appl. Phys. Lett. 72 (1998) 1374.
10. N. Nukaga, M. Mitsuya and H. Funakubo: Jpn. J. Appl. Phys. 39 (2000) 5496.
11. M. Noda, Y. Adachi, H. Sugiyama, T. Nakaiso and M. Okuyama: Appl. Phys. A 71 (2000) 113.
12. N. Fujimura, D. T. Thomas, S. K. Streiffer and A. I. Kingon: Jpn. J. Appl. Phys. 37 (1998) 5185.
13. C. H. Yang, J. S. Kim and S. G. Yoon: Integr. Ferroelectr. 21 (1998) 475.
14. K. Suu, T. Masuda, Y. Nishioka and N. Tani: Integr. Ferroelectr. 21 (1998) 407.
15. N. Ichinose and M. Watanabe: Jpn. J. Appl. Phys. 36 (1997) 5893.
16. S. Srinivas, M. Jain and R. S. Katiyar: Mater. Res. Soc. Symp. Proc. 580 (2000) 345.
17. S. T. Tay, X. H. Jiang, C. H. A. Huan, A. T. S. Wee and R. Liu: J. Appl. Phys. 88 (2000) 5928.
18. T. Zhu, Y. P. Wang, L. Zhou and A. G. Liu: Mater. Sci. Eng. B 89 (2002) 390.
19. K. Nishizawa, T. Miki, K. Suzuki and K. Kato: Mater. Lett. 52 (2002) 20.
20. Y. Makino, S. Miyake, S. Sano, H. Saito, B. Kyoh, H. Kuwahara and A. Yoshikawa: Proc. 8th Int. Conf. Microwave and High Frequency Heating, Bayreuth, 2001, p. 149.
21. T. Yoshioka, Y. Makino and S. Miyake: J. Mater. Sci. 38 (2003) 101.
22. T. Ueno, H. Saito, S. Sano, Y. Makino and S. Miyake: Proc. Powder Metallurgy World Congr. 2000, Kyoto (2000) p. 753.
23. S. Baba, K. Numata, H. Saito, M. Kumagai, T. Ueno, B. Kyoh and S. Miyake: Thin Solid Films 390 (2001) 70.
24. S. Song, X. Fu, H. Tan, M. Tao, L. Chen, L. Wang and C. Lin: Phys. Status Solidi A 164 (1997) 9.
25. J. H. Ahn, J. N. Lee, Y. C. Kim and B. T. Ahn: Curr. Appl. Phys. 2 (2002) 135.
26. M. Born and E. Wolf: Principles of Optics: Electromagnetic Theory of Propagation, Interference and Diffraction of Light (Pergamon, New York, 1969) 4th ed.
27. M. A. Rodriguez, T. J. Boyle, B. A. Hernandez, C. D. Buchheit and M. O. Eatough: J. Mater. Res. 11 (1996) 2282.
28. C. H. Lu and B. K. Fang: J. Mater. Res. 12 (1997) 2104.
29. R. Wroe and A. T. Rowley: J. Mater. Sci. 31 (1996) 2019.
30. M. A. Janney, H. D. Kimrey, W. R. Allen and J. O. Kiggans: J. Mater. Sci. 32 (1997) 1347.