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Volumn 16, Issue 19, 2004, Pages 1750-1753

Strongly enhanced thermal stability of crystalline organic thin films induced by aluminum oxide capping layers

(10) Sellner, Stefan b,c Gerlach, Alexander a Schreiber, Frank a Kelsch, Marion b Kasper, Nikolai b,d Dosch, Helmut b,c Meyer, Stephan c Pflaum, Jens c Fischer, Matthias c Gompf, Bruno c

a UNIVERSITY OF OXFORD (United Kingdom)

b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

c UNIVERSITY OF STUTTGART (Germany)

d KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTALLINE MATERIALS; DESORPTION; DIFFUSION; GOLD; HETEROJUNCTIONS; INTERFACES (MATERIALS); MASS SPECTROMETERS; SEMICONDUCTING FILMS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; VACUUM; X RAY DIFFRACTION ANALYSIS;

BRAGG PEAK; ORGANIC FILMS; ROOM TEMPERATURE (RT); THERMAL DESORPTION SPECTROSCOPY (TDS);

THIN FILMS;

EID: 9144241865 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200400461 Document Type: Article

Times cited : (38)

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