Improved conductivity of ZnO thin films by exposure to an atmospheric hydrogen plasma

MRS Advances

Volumn 1447, Issue , 2012, Pages 60-65

  Illiberi, A ^a   Kniknie, B ^a   Van Deelen, J ^a   Steijvers, H L A H ^a   Habets, D ^a   Simons, P J P M ^a   Janssen, A C ^a   Beckers, E H A ^a  

^a TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CRYSTALLINE MATERIALS; HYDROGEN; II-VI SEMICONDUCTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL FILMS; OXIDE FILMS; SUBSTRATES; THIN FILMS; ZINC OXIDE;

AL FILMS; ALUMINUM-DOPED ZINC OXIDE; CHEMICAL VAPOR DEPOSITION PROCESS; CRYSTALLINE QUALITY; GLASS SUBSTRATES; HIGH-THROUGHPUT; HYDROGEN PLASMAS; METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS; ZINC OXIDE (ZNO); ZNO THIN FILM;

METALLIC FILMS;

EID: 85128955544     PISSN: None     EISSN: 20598521     Source Type: Journal    
DOI: 10.1557/opl.2012.1063     Document Type: Conference Paper

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