High deposition rate of low resistive and transparent ZnO:Al on glass with an industrial moving belt APCVD reactor

Materials Research Society Symposium Proceedings

Volumn 1323, Issue , 2012, Pages 75-80

  Illiberi, A ^a   Kniknie, B ^a   Steijvers, H L A H ^a   Habets, D ^a   Simons, P J P M ^a   Beckers, E H A ^a   Van Deelen, J ^a  

^a TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM-DOPED ZNO; HIGH DEPOSITION RATES; IN-LINE; INITIAL EFFICIENCY; SURFACE-TEXTURING; VISIBLE RANGE; ZNO;

ALUMINUM; ALUMINUM COATINGS; AMORPHOUS FILMS; AMORPHOUS SILICON; ATMOSPHERIC PRESSURE; CONDUCTIVE FILMS; DEPOSITION RATES; GLASS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION;

ZINC OXIDE;

EID: 84455210963     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2011.826     Document Type: Conference Paper

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