-
2
-
-
56749137852
-
-
Ostendorf, A, Kulik, C. & Barsch, N. (2002) Processing thin silicon with ultrashort-pulsed lasers: creating an alternative to conventional sawing techniques, in Proceedings of 21st international congress on applications of lasers & electro-optics, Scottsdale, USA, LMF section A, 20-28.
-
Ostendorf, A, Kulik, C. & Barsch, N. (2002) Processing thin silicon with ultrashort-pulsed lasers: creating an alternative to conventional sawing techniques", in Proceedings of 21st international congress on applications of lasers & electro-optics, Scottsdale, USA, LMF section A, 20-28.
-
-
-
-
3
-
-
57049176547
-
High quality laser microcutting of difficult-to-cut materials - copper and silicon wafer
-
Scottsdale, USA
-
Lim, GC, A. Mai, T., Low, D., & Chen, Q. (2002) High quality laser microcutting of difficult-to-cut materials - copper and silicon wafer", in Proceedings of 21st international congress on applications of lasers & electro-optics, Scottsdale, USA.
-
(2002)
Proceedings of 21st international congress on applications of lasers & electro-optics
-
-
Lim, G.A.1
Mai, T.2
Low, D.3
Chen, Q.4
-
4
-
-
0003171019
-
Method to evaluate damage induced by dicing and laser cutting of silicon wafers
-
Ebutt, R., Danyluk, S., & Weisshaus, I. (1996) Method to evaluate damage induced by dicing and laser cutting of silicon wafers, Microstructural science 23, 89-94.
-
(1996)
Microstructural science
, vol.23
, pp. 89-94
-
-
Ebutt, R.1
Danyluk, S.2
Weisshaus, I.3
-
5
-
-
0037621723
-
Development of dicing technique for thin semiconductor substrates with femtosecond laser ablation
-
Kawahara, K., Kurogi, Y., Matsudo, N., Ninomiya, T., Sawada, H., Yokotani, A., & Kurosawa, K. (2003) Development of dicing technique for thin semiconductor substrates with femtosecond laser ablation, in Proceedings of SPIE 4830, third international symposium on laser precision microfabrication, 526-530.
-
(2003)
Proceedings of SPIE 4830, third international symposium on laser precision microfabrication
, pp. 526-530
-
-
Kawahara, K.1
Kurogi, Y.2
Matsudo, N.3
Ninomiya, T.4
Sawada, H.5
Yokotani, A.6
Kurosawa, K.7
-
6
-
-
0141788780
-
-
Lizotte, (2003) T. Laser dicing of chip scale and silicon wafer scale packages, in Proceedings of IEEE/CPMT/SEMI Int'l electronics manufacturing technology symposium, 1-5.
-
Lizotte, (2003) T. Laser dicing of chip scale and silicon wafer scale packages, in Proceedings of IEEE/CPMT/SEMI Int'l electronics manufacturing technology symposium, 1-5.
-
-
-
-
7
-
-
2342451939
-
High power UV laser machining of silicon wafers
-
Corboline, T., C. Rea, E., & Dunsky, C. (2003) High power UV laser machining of silicon wafers, in Proceedings of SPIE 5063, Fourth international symposium on laser precision microfabrication, 495-500.
-
(2003)
Proceedings of SPIE 5063, Fourth international symposium on laser precision microfabrication
, pp. 495-500
-
-
Corboline, T.C.1
Rea, E.2
Dunsky, C.3
-
8
-
-
0014773454
-
-
A. Hardway, G. (1970) Applications of laser systems to microelectronics and silicon wafer dicing, Solid state technology, 63-67.
-
A. Hardway, G. (1970) Applications of laser systems to microelectronics and silicon wafer dicing, Solid state technology, 63-67.
-
-
-
-
9
-
-
57349158099
-
-
Li, M. (2003) Effect of laser parameters on semiconductor micromachining using diode-pumped solid-state lasers, in Proceedings of 22nd international congress on applications of lasers & electro-optics, Jacksonville, USA, LMF section B, 7-15.
-
Li, M. (2003) Effect of laser parameters on semiconductor micromachining using diode-pumped solid-state lasers, in Proceedings of 22nd international congress on applications of lasers & electro-optics, Jacksonville, USA, LMF section B, 7-15.
-
-
-
-
10
-
-
0033723265
-
Novel technique for high-quality microstructuring with excimer lasers
-
Roth, S. & Prof. Geiger, M. (2000) Novel technique for high-quality microstructuring with excimer lasers, in Proceedings of SPIE 3933, Laser applications in microelectronics and optoelectronics manufacturing V, 338-346.
-
(2000)
Proceedings of SPIE 3933, Laser applications in microelectronics and optoelectronics manufacturing
, vol.5
, pp. 338-346
-
-
Roth, S.1
Prof2
Geiger, M.3
-
11
-
-
0029359745
-
Enhancement of material ablation using 248, 308, 532, 1064 nm laser pulse with a water film on the treated surface
-
Dupont, A., Caminat, P., & Bournot, P. (1995) Enhancement of material ablation using 248, 308, 532, 1064 nm laser pulse with a water film on the treated surface, J. Appl. Phys. 78, 2022-2028.
-
(1995)
J. Appl. Phys
, vol.78
, pp. 2022-2028
-
-
Dupont, A.1
Caminat, P.2
Bournot, P.3
|