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Volumn 212, Issue 7, 2015, Pages 1563-1570

MOCVD of TiO2 thin films from a modified titanium alkoxide precursor

Author keywords

electrical properties; MOCVD; precursors; thin films; Ti alkoxide; TiO2

Indexed keywords

ATOMIC FORCE MICROSCOPY; COORDINATION REACTIONS; ELECTRIC PROPERTIES; ENAMELS; FIELD EMISSION MICROSCOPES; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEAR REACTIONS; ORGANIC CHEMICALS; ORGANOMETALLICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM; VAPOR DEPOSITION; X RAY DIFFRACTION;

EID: 85027956004     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201532271     Document Type: Article
Times cited : (6)

References (39)
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    • 85028194424 scopus 로고    scopus 로고
    • http://srdata.nist.gov/xps/


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.