Effect of AC electric fields on the aerosol assisted chemical vapour deposition growth of titanium dioxide thin films

Surface and Coatings Technology

Volumn 230, Issue , 2013, Pages 196-201

  Romero, Luz ^a   Binions, Russell ^a  

^a QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

Aerosol assisted CVD; Electric field; Photocatalysis; Titanium dioxide

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOUR DEPOSITIONS; CHEMICAL VAPOUR DEPOSITION; FLUORINE DOPED TIN OXIDE; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PROPERTY; PREFERENTIAL ORIENTATION; SCANNING ELECTRON MICROSCOPE; TITANIUM DIOXIDE THIN FILM;

AEROSOLS; CHEMICAL VAPOR DEPOSITION; OXIDES; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; VAPORS; X RAY DIFFRACTION;

ELECTRIC FIELDS;

EID: 84881312787     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.05.026     Document Type: Article

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