TiO2 thin films by chemical vapor deposition: An XPS characterization

Surface Science Spectra

Volumn 14, Issue 1-4, 2007, Pages 27-33

  Barreca, Davide ^a   Gasparotto, Alberto ^b   Maccato, Chiara ^b   Maragno, Cinzia ^b   Tondello, Eugenio ^b  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Chemical vapor deposition; Thin films; TiO2; XPS

Indexed keywords

CHEMICAL COMPOSITIONS; CHEMICAL VAPOR DEPOSITIONS (CVD); COMPLEMENTARY TECHNIQUES; COMPREHENSIVE RESEARCH; GLANCING INCIDENCE X-RAY DIFFRACTIONS; NANOCRYSTALLINE TIO2; TIO; XPS CHARACTERIZATION;

PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM DIOXIDE; VAPORS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 77956901763     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/11.20070902     Document Type: Article

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