n-Type polysilicon passivating contact for industrial bifacial n-type solar cells

Solar Energy Materials and Solar Cells

Volumn 158, Issue , 2016, Pages 24-28

  Stodolny, M K ^a   Lenes, M ^b   Wu, Y ^a   Janssen, G J M ^a   Romijn, I G ^a   Luchies, J R M ^b   Geerligs, L J ^a  

^a TNO   (Netherlands)

^b Tempress Systems BV   (Netherlands)

Author keywords

Bifacial; Carrier selective contact; LPCVD; n type solar cell; Passivating contact; Polysilicon

Indexed keywords

EFFICIENCY; PASSIVATION; POLYCRYSTALLINE MATERIALS; POLYSILICON; SILICON NITRIDE;

BIFACIAL; INDUSTRIAL PROCESSS; LPCVD; OXIDE PROPERTIES; RECOMBINATION CURRENTS; SCREEN-PRINTED; SELECTIVE CONTACTS; TEXTURED SURFACE;

SOLAR CELLS;

EID: 84991757016     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2016.06.034     Document Type: Article

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