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Volumn , Issue , 2015, Pages

Implementation of tunneling pasivated contacts into industrially relevant n-Cz Si solar cells

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN BOUNDARIES; METALS; PRECIPITATION (CHEMICAL); SILICON; SILICON WAFERS; SOLAR CELLS;

EID: 84961613296     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2015.7356062     Document Type: Conference Paper
Times cited : (21)

References (8)
  • 1
    • 10044269932 scopus 로고    scopus 로고
    • Recombination activity of interstitial iron and other transition metal point defects in p-and n-type crystalline silicon
    • D. Macdonald and L. J. Geerligs, "Recombination activity of interstitial iron and other transition metal point defects in p-and n-type crystalline silicon, " Appl. Phys. Lett., vol. 85, no. 18, p. 4061, 2004.
    • (2004) Appl. Phys. Lett , vol.85 , Issue.18 , pp. 4061
    • Macdonald, D.1    Geerligs, L.J.2
  • 6
    • 85019535460 scopus 로고    scopus 로고
    • Passivated tunneling contacts to n-type wafer silicon and their implementation into high performance solar cells
    • P. Stradins, S. Essig, W. Nemeth, et al., "Passivated Tunneling Contacts to N-Type Wafer Silicon and Their Implementation into High Performance Solar Cells, " WCPEC-6, 2014.
    • (2014) WCPEC-6
    • Stradins, P.1    Essig, S.2    Nemeth, W.3
  • 7
    • 84908452965 scopus 로고    scopus 로고
    • Effect of rapid thermal annealing on recombination centres in boron-doped Czochralski-grown silicon
    • D. C. Walter, B. Lim, K. Bothe, V. V. Voronkov, R. Falster, and J. Schmidt, "Effect of rapid thermal annealing on recombination centres in boron-doped Czochralski-grown silicon, " Appl. Phys. Lett., vol. 104, no. 4, p. 042111, 2014.
    • (2014) Appl. Phys. Lett , vol.104 , Issue.4 , pp. 042111
    • Walter, D.C.1    Lim, B.2    Bothe, K.3    Voronkov, V.V.4    Falster, R.5    Schmidt, J.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.