Interplay between intercalated oxygen superstructures and monolayer h-BN on Cu(100)

Physical Review B

Volumn 94, Issue 6, 2016, Pages

  Ma, Chuanxu ^a   Park, Jewook ^a   Liu, Lei ^b   Kim, Yong Sung ^a,b,c,d   Yoon, Mina ^a,b   Baddorf, Arthur P ^a   Gu, Gong ^b   Li, An Ping ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c Korea Research Institute of Standards and Science   (South Korea)

^d University of Science and Technology (UST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; III-V SEMICONDUCTORS; MONOLAYERS; OXIDATION RESISTANCE; OXYGEN; SCANNING TUNNELING MICROSCOPY; VAN DER WAALS FORCES; X RAY PHOTOELECTRON SPECTROSCOPY;

CONFINED ATOMS; CONFINEMENT EFFECTS; HEXAGONAL BORON NITRIDE (H-BN); NANO-ISLANDS; OXYGEN INTERCALATION; THERMAL ANNEALING PROCESS; TWO DIMENSIONAL (2 D); VAN DER WAALS;

BORON NITRIDE;

EID: 84985906436     PISSN: 24699950     EISSN: 24699969     Source Type: Journal    
DOI: 10.1103/PhysRevB.94.064106     Document Type: Article

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