Picosecond and nanosecond laser annealing and simulation of amorphous silicon thin films for solar cell applications

Journal of Applied Physics

Volumn 115, Issue 4, 2014, Pages

  Theodorakos, I ^a   Zergioti, I ^a   Vamvakas, V ^b   Tsoukalas, D ^a   Raptis, Y S ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b Heliosphera SA Industrial Area of Tripolis   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; NANOCRYSTALLIZATION; NANOSTRUCTURED MATERIALS; NEODYMIUM LASERS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PUMPING (LASER); SILICON SOLAR CELLS; SOLAR CELLS; SOLID STATE LASERS; THIN FILM SOLAR CELLS; X RAY DIFFRACTION;

AMORPHOUS SILICON LAYERS; AMORPHOUS SILICON THIN FILMS; ANNEALED MATERIALS; ANNEALING CONDITION; ANNEALING PARAMETERS; DIODE PUMPED SOLID STATE LASER; SOLAR-CELL APPLICATIONS; TANDEM SOLAR CELLS;

AMORPHOUS SILICON;

EID: 84979201687     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4863402     Document Type: Article

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