Investigation on laser-annealing and subsequent laser-nanotexturing of amorphous silicon (a-Si) films for photovoltaic application

Journal of Laser Micro Nanoengineering

Volumn 5, Issue 2, 2010, Pages 150-155

  Palani, I A ^a   Vasa, N J ^a   Singaperumal, M ^a   Okada, T ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Amorphous silicon (a Si); Laser annealing; Laser nano texturing; Nd3+: YAG; Photovoltaic application; Polycrystalline silicon

Indexed keywords

AMORPHOUS SILICON (A-SI); LASER ANNEALING; ND3+: YAG; PHOTOVOLTAIC APPLICATION; POLYCRYSTALLINE SILICON;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; AMORPHOUS SILICON; ANNEALING; NEODYMIUM; PHOTOVOLTAIC EFFECTS; POLYCRYSTALLINE MATERIALS; POLYSILICON; THREE DIMENSIONAL; THREE DIMENSIONAL COMPUTER GRAPHICS;

PULSED LASERS;

EID: 79953020027     PISSN: None     EISSN: 18800688     Source Type: Journal    
DOI: 10.2961/jlmn.2010.02.0010     Document Type: Article

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