SCOPUS 정보 검색 플랫폼

Volumn 15, Issue , 2012, Pages 179-188

From R&D to mass production of Micromorph thin film silicon PV

(20) Meier, J a Kroll, U a Benagli, S a Fesquet, L a Steinhauser, J a Borello, D a Orhan, J B a Djeridane, Y a Vallat Sauvain, E a Fecioru Morariu, M b Mereu, B b Kalas, J b Hoetzel, J b Losio, P b Kupich, M b Kluth, O b Eisenhammer, T b Weidman, D c Marjanovic, S c Kohnke, G c

a Oerlikon Solar Lab SA (Switzerland)

b Oerlikon Solar AG (Switzerland)

c Corning Incorporated ^* (United States)

Author keywords

Amorphous silicon; Light trapping; Microcrystalline silicon; PECVD; Thin film Si PV; VHF GD; ZnO

Indexed keywords

A-SI:H; CELL EFFICIENCY; LIGHT-TRAPPING; MASS PRODUCTION; MODULE PRODUCTION; TANDEM DEVICES; THIN FILM SILICON; TOTAL POWER; UPSCALING; VHF-GD; ZNO;

AMORPHOUS SILICON; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; ZINC OXIDE;

SILICON;

EID: 84860535352 PISSN: 18766102 EISSN: None Source Type: Conference Proceeding
DOI: 10.1016/j.egypro.2012.02.021 Document Type: Conference Paper

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.