Hollow-cathode-triggered plasma pinch discharge

EUV Sources for Lithography

Volumn , Issue , 2006, Pages 395-411

  Pankert, Joseph ^a   Bergmann, Klaus ^b   Wester, Rolf ^b   Klein, Jürgen ^b   Neff, Willi ^b   Rosier, Oliver ^b   Seiwert, Stefan ^b   Smith, Christopher ^b   Probst, Sven ^b   Vaudrevange, Dominik ^a   Siemons, Guido ^a   Apetz, Rolf ^a   Jonkers, Jeroen ^a   Loeken, Michael ^a   Derra, Günther ^c   Krücken, Thomas ^d   Zink, Peter ^d  

^a Philips Extreme UV GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HOLLOW CATHODES; PLASMA PINCH;

EID: 84960299259     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1117/3.613774.Ch13     Document Type: Chapter

References (18)

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12. See Chapter 7 in this book.
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