An electrochemical, microtopographical and ambient pressure x-ray photoelectron spectroscopic investigation of Si/TiO2/Ni/electrolyte interfaces

Journal of the Electrochemical Society

Volumn 163, Issue 2, 2016, Pages H139-H146

  Lichterman, Michael F ^a,b   Richter, Matthias H ^a,b   Hu, Shu ^a,b   Crumlin, Ethan J ^c   Axnanda, Stephanus ^c   Favaro, Marco ^c   Drisdell, Walter ^c   Hussain, Zahid ^c   Brunschwig, Bruce S ^b,d   Lewis, Nathan S ^a,b,d   Liu, Zhi ^c,e,f   Lewerenz, Hans Joachim ^b  

^a California Institute of Technology   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^e SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^f SHANGHAITECH UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ELECTRODES; ELECTROLYTES; MAGNESIUM PRINTING PLATES; NICKEL; PHOTOELECTRONS; PHOTONS; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR JUNCTIONS; TITANIUM DIOXIDE;

AMBIENT-PRESSURE X-RAY PHOTOELECTRON SPECTROSCOPIES; DEGREE OF CONDUCTIVITY; ELECTROCHEMICAL BEHAVIORS; ELECTROLYTE JUNCTIONS; ELECTROLYTE SOLUTIONS; SPECTROSCOPIC INVESTIGATIONS; SPECTROSCOPIC PROPERTY; X-RAY PHOTOELECTRONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84949566970     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.0861602jes     Document Type: Article

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