Fabrication of graphite grids via stencil lithography for highly sensitive motion sensors

Carbon

Volumn 96, Issue , 2016, Pages 491-496

  Park, Seong Jun ^a   Kim, Dae Woo ^a   Jang, Sung Woo ^a   Jin, Ming Liang ^a   Kim, Seon Joon ^a   Ok, Jong Min ^a   Kim, Jong Seon ^a   Jung, Hee Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GRAPHITE;

GAUGE FACTORS; GRAPHITE FILMS; MASS PRODUCTION; MOTION SENSORS; OXYGEN PLASMAS; STENCIL LITHOGRAPHY; STENCIL MASKS; STRAIN LOADING;

REACTIVE ION ETCHING;

EID: 84947917531     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2015.09.080     Document Type: Article

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