Fabrication of complex patterns with a wide range of feature sizes from a single line prepattern by successive application of capillary force lithography

Langmuir

Volumn 26, Issue 17, 2010, Pages 14359-14363

  Lee, Su Kyong ^a   Jung, Jin Mi ^a,b   Lee, Ji Sun ^a   Jung, Hee Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARY FORCE LITHOGRAPHY; CFL CONDITION; COMPLEX PATTERN; DEGREE OF ROTATION; E-BEAM LITHOGRAPHY; ETCHING PROCESS; FEATURE SIZES; FIRST CYCLE; GOLD PATTERN; IMPRINT LITHOGRAPHY; LINE PATTERN; NANO ELECTROMECHANICAL SYSTEMS; NANO-IMPRINT; NANO-SIZED; NANOELECTRONIC DEVICES; PATTERNED SUBSTRATES; PERIODIC PATTERN; POLYDIMETHYLSILOXANE PDMS; POLYMER THICKNESS; SHAPED PATTERN; SOFT LITHOGRAPHY; TIME-CONSUMING PROCESS;

BIOSENSORS; BLOOD VESSELS; FABRICATION; NANOELECTRONICS; REACTIVE ION ETCHING; SILICONES;

NANOIMPRINT LITHOGRAPHY;

EID: 77957961195     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100414c     Document Type: Article

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