Effect of Front TCO Layer on Properties of Substrate-Type Thin-Film Microcrystalline Silicon Solar Cells

IEEE Journal of Photovoltaics

Volumn 5, Issue 6, 2015, Pages 1528-1533

  Sai, Hitoshi ^a   Maejima, Keigo ^b,c   Matsui, Takuya ^a   Koida, Takashi ^a   Matsubara, Koji ^a   Kondo, Michio ^d   Takeuchi, Yoshiaki ^e   Sugiyama, Shuichiro ^f   Katayama, Hirotaka ^g   Yoshida, Isao ^b,h  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Photovoltaic Power Generation Technology Research Association PVTEC   (Japan)

^c KAGOSHIMA UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^e MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^f SHARP CORPORATION   (Japan)

^g PANASONIC CORPORATION   (Japan)

^h PA/FA Measurement and Control Committee   (Japan)

Author keywords

Conductive films; light trapping; photovoltaic cells; silicon; thin film devices

Indexed keywords

CONDUCTIVE FILMS; EFFICIENCY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON; OPEN CIRCUIT VOLTAGE; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; SILICON; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); EFFICIENCY IMPROVEMENT; FILL FACTOR; IMPROVEMENT MECHANISM; POWER CONVERSION EFFICIENCIES; SUBSTRATE TYPES; TRANSPARENT CONDUCTIVE OXIDE FILMS; ZNO;

SILICON SOLAR CELLS;

EID: 84947038074     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2015.2478030     Document Type: Article

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