Enhanced electrical and optical properties of boron-doped ZnO films grown by low pressure chemical vapor deposition for amorphous silicon solar cells

Ceramics International

Volumn 42, Issue 1, 2016, Pages 1361-1365

  Li, Wang ^a   Li, Yingyi ^b   Du, Guoping ^b   Chen, Nan ^b   Liu, Shiyong ^a   Wang, Shipeng ^a   Huang, Haiyan ^a   Lu, Chuan ^a   Niu, Xinwei ^a  

^a Chint Solar (Zhejiang) Co Ltd   (China)

^b NANCHANG UNIVERSITY   (China)

Author keywords

Amorphous silicon; Boron doped ZnO film; Low pressure chemical vapor deposition; Thin film solar cell

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; CONVERSION EFFICIENCY; DEPOSITION; EFFICIENCY; ELECTRODES; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SILICON; SILICON SOLAR CELLS; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

AMORPHOUS SILICON THIN FILMS; BORON-DOPED; ELECTRICAL AND OPTICAL PROPERTIES; HIGH CONVERSION EFFICIENCY; HIGH ELECTRICAL CONDUCTIVITY; OPTICAL TRANSPARENCY; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDE FILMS;

OPTICAL FILMS;

EID: 84946811202     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2015.09.075     Document Type: Article

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