Approaches to CMOS integration of epitaxial gadolinium oxide high-K dielectrics

ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Volumn , Issue , 2006, Pages 150-153

  Gottlob, H D B ^a   Echtermeyer, T ^a   Mollenhauer, T ^a   Schmidt, M ^a   Efavi, J K ^a   Wahlbrink, T ^a   Lemme, M C ^a   Kurz, H ^a   Endres, R ^b   Stefanov, Y ^b   Schwalke, U ^b   Czernohorsky, M ^c   Bugiel, E ^c   Fissel, A ^c   Osten, H J ^c  

^a AMO GMBH   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; EPITAXIAL FILMS; GADOLINIUM COMPOUNDS; ULTRATHIN FILMS;

DAMASCENE METAL GATE; GATE PROCESS; OXIDE DAMAGES; PLANAR GATE STACK;

CMOS INTEGRATED CIRCUITS;

EID: 84943200196     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2006.307660     Document Type: Conference Paper

References (13)

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