Thermal Oxidation of WSe2 Nanosheets Adhered on SiO2/Si Substrates

Nano Letters

Volumn 15, Issue 8, 2015, Pages 4979-4984

  Liu, Yingnan ^a   Tan, Cheng ^b   Chou, Harry ^b   Nayak, Avinash ^b   Wu, Di ^a   Ghosh, Rudresh ^b   Chang, Hsiao Yu ^b   Hao, Yufeng ^b   Wang, Xiaohan ^b   Kim, Joon Seok ^b   Piner, Richard ^b   Ruoff, Rodney S ^b,c,d   Akinwande, Deji ^b   Lai, Keji ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b The University of Texas at Austin   (United States)

^c Institute for Basic Science   (South Korea)

^d Ulsan National Institute of Science and Technology   (South Korea)

Author keywords

2D materials; microwave impedance microscopy; secondary ion mass spectroscopy; thermal oxidation; Tungsten diselenide

Indexed keywords

ANISOTROPY; CHEMICAL BONDS; ETCHING; NANOSHEETS; REDUCTION; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SELENIUM COMPOUNDS; SILICA; THERMOOXIDATION;

MICROWAVE IMPEDANCE; OUT-OF-PLANE DIRECTION; PARTIAL OXIDATIONS; SECONDARY ION MASS SPECTROSCOPY; STRUCTURAL ANISOTROPY; THERMAL OXIDATION; TUNGSTEN DISELENIDE; TWO DIMENSIONAL (2 D);

TUNGSTEN COMPOUNDS;

EID: 84939233911     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/acs.nanolett.5b02069     Document Type: Article

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