Growth of β-gallium oxide films and nanostructures by atmospheric- pressure CVD using gallium and water as source materials

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 12, Issue 7, 2015, Pages 985-988

  Terasako, Tomoaki ^a   Ichinotani, Hikaru ^a   Yagi, Masakazu ^b  

^a EHIME UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemical vapour deposition; Nanostructure; Thin film; Ga2O3

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; GALLIUM COMPOUNDS; GOLD; NANOBELTS; NANORODS; NANOSTRUCTURES; SAPPHIRE; THIN FILMS;

1-D NANOSTRUCTURES; ATMOSPHERIC PRESSURE CVD; C-PLANE SAPPHIRE; CHEMICAL VAPOUR DEPOSITION; GROWTH MECHANISMS; OPTICAL GAP ENERGIES; ORIENTED POLYCRYSTALLINE; PHOTOLUMINESCENCE MEASUREMENTS;

OXIDE FILMS;

EID: 84935717648     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201510012     Document Type: Article

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