Carbon out-diffusion mechanism for direct graphene growth on a silicon surface

Acta Materialia

Volumn 96, Issue , 2015, Pages 18-23

  Kim, Byung Sung ^a   Lee, Jong Woon ^b,c   Jang, Yamujin ^b,c   Choi, Soon Hyung ^b,c   Cha, Seung Nam ^a   Sohn, Jung Inn ^a   Kim, Jong Min ^a   Joo, Won Jae ^c   Hwang, Sungwoo ^c   Whang, Dongmok ^b,c  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b Sungkyunkwan University   (South Korea)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Carbon diffusion; Chemical vapor deposition; Graphene; Silicon; Thermal conductivity

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIFFUSION; GRAPHENE; SILICON; THERMAL CONDUCTIVITY; THERMAL CONDUCTIVITY OF SOLIDS;

CARBON DIFFUSION; GRAPHENE GROWTH; GRAPHITIC LAYERS; HIGH-TEMPERATURE ANNEALING; LATTICE DIMENSIONS; LOW THERMAL CONDUCTIVITY; OUT DIFFUSION; SILICON SURFACES;

SEMICONDUCTING SILICON;

EID: 84931272490     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2015.06.002     Document Type: Article

References (44)

1. H. Yang, J. Heo, S. Park, H.J. Song, D.H. Seo, K.E. Byun, P. Kim, I. Yoo, H.J. Chung, and K. Kim Science 336 2012 1140
2. J.H. Lee, E.K. Lee, W.J. Joo, Y. Jang, B.S. Kim, J.Y. Lim, S.H. Choi, S.J. Ahn, J.R. Ahn, M.H. Park, C.W. Yang, B.L. Choi, S.W. Hwang, and D. Whang Science 344 2014 286
3. G. Kalita, M.S. Kayastha, H. Uchida, K. Wakita, and M. Umeno RSC Adv. 2 2012 3225
4. J. Chen, Y. Guo, Y. Wen, L. Huang, Y. Xue, D. Geng, B. Wu, B. Luo, G. Yu, and Y. Liu Adv. Mater. 25 2013 992
5. D.I. Son, B.W. Kwon, D.H. Park, W.S. Seo, Y. Yi, B. Angadi, C.L. Lee, and W.K. Choi Nat. Nanotechnol. 7 2012 465
6. J. Bae, Y.J. Park, M. Lee, S.N. Cha, Y.J. Choi, C.S. Lee, J.M. Kim, and Z.L. Wang Adv. Mater. 23 2011 3446
7. L. Oakes, A. Westover, J.W. Mares, S. Chatterjee, W.R. Erwin, R. Bardhan, S.M. Weiss, and C.L. Pint Sci. Rep. 3 2013 3020
8. E. Stratakis, G. Eda, H. Yamaguchi, E. Kymakis, C. Fotakis, and M. Chhowalla Nanoscale 4 2012 3069
9. G. Hong, Q.H. Wu, J. Ren, and S.T. Lee Appl. Phys. Lett. 100 2012 231604
10. R.I. Scace, and G.A. Slack J. Chem. Phys. 30 1959 1551
11. M. De Crescenzi, M. Marucci, R. Gunnella, P. Castrucci, M. Casalboni, G. Dufour, and F. Rochet Surf. Sci. 426 1999 277
12. P. Thanh Trung, F. Joucken, J. Campos-Delgado, J.P. Raskin, B. Hackens, and R. Sporken Appl. Phys. Lett. 102 2013 013118
13. J. Tersoff Phys. Rev. Lett. 74 1995 5080
14. M. Gorman, and S.A. Solin Solid State Commun. 15 1974 761
15. R.S. Wagner, and W.C. Ellis Appl. Phys. Lett. 4 1964 89
16. V. Schmidt, J.V. Wittemann, S. Senz, and U. Gösele Adv. Mater. 21 2009 2681
17. S.A. Dayeh, J. Wang, N. Li, J.Y. Huang, A.V. Gin, and S.T. Picraux Nano Lett. 11 2011 4200
18. K.B. Kim, C.M. Lee, and J. Choi J. Phys. Chem. C 115 2011 14488
19. L. Zhang, Z. Shi, Y. Wang, R. Yang, D. Shi, and G. Zhang Nano Res. 4 2011 315
20. R.C. Newman, and J.B. Willis J. Phys. Chem. Solids 26 1965 373
21. E. Finkman, H. Rücker, F. Meyer, S.D. Prawer, D. Bouchier, J. Boulmer, S. Bodnar, and J.L. Regolini Thin Solid Films 294 1997 118
22. M. Meléndez-Lira, J. Menéndez, K.M. Kramer, M.O. Thompson, N. Cave, R. Liu, J.W. Christiansen, N.D. Theodore, and J.J. Candelaria J. Appl. Phys. 82 1997 4246
23. J.C. Tsang, K. Eberl, S. Zollner, and S.S. Iyer Appl. Phys. Lett. 61 1992 961
24. L.W. Song, X.D. Zhan, B.W. Benson, and G.D. Watkins Phys. Rev. B 42 1990 5765
25. R.S. Sussman, and R. Ogden Philos. Mag. B 44 1981 137
26. Y. Katayama, K. Usami, and T. Shimada Philos. Mag. B 43 1981 283
27. H. Wieder, M. Cardona, and C.R. Guarnieri Phys. Status Solidi B 92 1979 99
28. K. Yoshii, Y. Suzaki, A. Takeuchi, K. Yasutake, and H. Kawabe Thin Solid Films 199 1991 85
29. S. Kerdiles, A. Hairie, R. Rizk, and C. Guedj Phys. Rev. B: Condens. Matter Mater. Phys. 63 2001 2052061
30. J. Wasyluk, T.S. Perova, and F. Meyer J. Appl. Phys. 107 2010 023518
31. T. Uchino, K.N. Bourdakos, C.H. De Groot, P. Ashburn, M.E. Kiziroglou, G.D. Dilliway, and D.C. Smith Appl. Phys. Lett. 86 2005 1
32. D. Takagi, H. Hibino, S. Suzuki, Y. Kobayashi, and Y. Homma Nano Lett. 7 2007 2272
33. R.B. Capaz, A. Dal Pino Jr., and J.D. Joannopoulos Phys. Rev. B 50 1994 7439
34. P. Leary, R. Jones, S. Öberg, and V.J.B. Torres Phys. Rev. B: Condens. Matter Mater. Phys. 55 1997 2188
35. J.A. Baker, T.N. Tucker, N.E. Moyer, and R.C. Buschert J. Appl. Phys. 39 1968 4365
36. A.A. Demkov, and O.F. Sankey Phys. Rev. B 48 1993 2207
37. L. Vegard Physik. Z. 5 1921 17
38. W. Faschinger, S. Zerlauth, G. Bauer, and L. Palmetshofer Appl. Phys. Lett. 67 1995 3933
39. P. Dollfus, S. Galdin, P. Hesto, and J.E. Velazquez IEEE Trans. Electron Devices 47 2000 1247
40. C. Summonte, R. Rizzoli, M. Bianconi, A. Desalvo, D. Iencinella, and F. Giorgis J. Appl. Phys. 96 2004 3987
41. B. Abeles Phys. Rev. 131 1963 1906
42. Z. Wang, and N. Mingo Appl. Phys. Lett. 97 2010 101903
43. L. Yin, E. Kyung Lee, J. Woon Lee, D. Whang, B. Lyong Choi, and C. Yu Appl. Phys. Lett. 101 2012 043114
44. D. Gracin, K. Juraic, P. Dubcek, A. Gajovic, and S. Bernstorff Vacuum 80 2005 98