Electrochromic study on amorphous tungsten oxide films by sputtering

Thin Solid Films

Volumn 587, Issue , 2015, Pages 75-82

  Li, Chuan ^a,b   Hsieh, J H ^c   Hung, Ming Tsung ^b   Huang, B Q ^a  

^a NATIONAL YANG MING UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^c MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Amorphous film; Cyclic voltammetry; Electrochemical insertion; Electrochromism; Potentiostat; Sputtering; Tungsten oxide

Indexed keywords

AMORPHOUS FILMS; CYCLIC VOLTAMMETRY; ELECTROCHROMISM; INFRARED DEVICES; NEAR INFRARED SPECTROSCOPY; OXIDES; OXYGEN; SPUTTERING; TUNGSTEN COMPOUNDS; TUNGSTEN METALLOGRAPHY; VOLTAGE REGULATORS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL INSERTION; ELECTROCHROMIC FUNCTIONS; POTENTIOSTATS; QUANTITATIVE EVALUATION; SCANNING ELECTRONIC MICROSCOPES; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILMS; VISIBLE-NEAR INFRARED SPECTROSCOPY;

OXIDE FILMS;

EID: 84929279862     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.12.022     Document Type: Article

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