SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 532, Issue , 2013, Pages 1-6

Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices

(6) Oka, N a Watanabe, M a Sugie, K b Iwabuchi, Y b Kotsubo, H b Shigesato, Y a

a AOYAMA GAKUIN UNIVERSITY (Japan)

b BRIDGESTONE CORPORATION (Japan)

Author keywords

Electrochromic devices; High rate deposition; Hollow cathode gas flow sputtering; WO3 films

Indexed keywords

AMORPHOUS WO; CONVENTIONAL DC MAGNETRON SPUTTERING; HIGH-RATE DEPOSITION; HOLLOW CATHODES; METAL TARGET; ORDERS OF MAGNITUDE; SN-DOPED IN; SPUTTERING POWER;

CATHODES; DEPOSITS; ELECTROCHROMIC DEVICES; FLOW OF GASES; TIN; TUNGSTEN;

AMORPHOUS FILMS;

EID: 84875219928 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.11.149 Document Type: Article

Times cited : (29)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.