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Volumn 202, Issue 1-2, 2002, Pages 104-109

Study on Raman spectra of electrochromic c-WO 3 films and their infrared emittance modulation characteristics

Author keywords

dc reactive sputtering; Emmisivity; Infrared reflectance; Polycrystalline tungsten oxide films

Indexed keywords

ELECTROCHEMISTRY; INFRARED RADIATION; LIGHT REFLECTION; POLYCRYSTALLINE MATERIALS; RAMAN SCATTERING; SPUTTERING; THIN FILMS; TUNGSTEN COMPOUNDS;

EID: 0037114355     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00943-1     Document Type: Article
Times cited : (37)

References (14)
  • 3
    • 0031999551 scopus 로고    scopus 로고
    • Visible and infrared optical constants of electrochromic materials for emissivity modulation applications
    • Hale J.S., DeVries M., Dworak B., Woollam J.A. Visible and infrared optical constants of electrochromic materials for emissivity modulation applications Thin Solid Films 313/314 1998 205-209.
    • (1998) Thin Solid Films , vol.313-314 , pp. 205-209
    • Hale, J.S.1    DeVries, M.2    Dworak, B.3    Woollam, J.A.4
  • 4
    • 0033534994 scopus 로고    scopus 로고
    • Prospects for IR emissivity control using electrochromic structures
    • Hale S., Woolam A. Prospects for IR emissivity control using electrochromic structures Thin Solid Films 339 1999 174-180.
    • (1999) Thin Solid Films , vol.339 , pp. 174-180
    • Hale, S.1    Woolam, A.2
  • 5
    • 0033310856 scopus 로고    scopus 로고
    • Infrared emittance modulation devices using electrochromic crystalline tungsten oxide, polymer conductor, and nickel oxide
    • Trimble C., DeVries M., Hale J.S., Thompson D.W., Tiwald T.E., Woollam J.A. Infrared emittance modulation devices using electrochromic crystalline tungsten oxide, polymer conductor, and nickel oxide Thin Solid Films 355/356 1999 26-34.
    • (1999) Thin Solid Films , vol.355-356 , pp. 26-34
    • Trimble, C.1    DeVries, M.2    Hale, J.S.3    Thompson, D.W.4    Tiwald, T.E.5    Woollam, J.A.6
  • 8
    • 0001189515 scopus 로고
    • 3 films deposited on ambient temperature glass substrates by an oxygen ion-assisted technique
    • 3 films deposited on ambient temperature glass substrates by an oxygen ion-assisted technique J. Appl. Phys. 67 6 1990 3177-3179.
    • (1990) J. Appl. Phys. , vol.67 , Issue.6 , pp. 3177-3179
    • Arntz, F.O.1    Goldner, R.B.2    Morel, B.3    Hass, T.E.4    Wong, K.K.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.