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Volumn 15, Issue 4, 2014, Pages 273-276

Electrochromic characterization of amorphous tungsten oxide films deposited on indium tin oxide and CVD-graphene electrodes by RF magnetron sputtering

(7) Choi, Dong Soo a,c Han, Seung Ho c Kim, Hyeongkeun c Kim, Tae Young d Rhyu, Se Hyun c Yoon, Dae Ho a,b Yang, Woo Seok c

a Sungkyunkwan University (South Korea)

b Sungkyunkwan University (South Korea)

c Korea Electronic Technology Institute (KETI) (South Korea)

d Gachon University (South Korea)

Author keywords

Electrochromic; Flexible; Graphene; ITO; Sputtering; WOx

Indexed keywords

EID: 84916228599 PISSN: 12299162 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (5)

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