Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

Nanotechnology

Volumn 25, Issue 39, 2014, Pages

  Yang, Xiaomin ^a   Xiao, Shuaigang ^a   Hu, Wei ^a   Hwu, Justin ^a   Van De Veerdonk, René ^a   Wago, Koichi ^a   Lee, Kim ^a   Kuo, David ^a  

^a SEAGATE TECHNOLOGY   (United States)

Author keywords

bit patterned media; directed self assembly; template fabrication

Indexed keywords

BLOCK COPOLYMERS; COPOLYMERS; DEFECT DENSITY; FABRICATION; INDUSTRIAL RESEARCH; INTEGRATION; ION BEAMS; ITERATIVE METHODS; PHOTORESISTS; SELF ASSEMBLY;

BIT-PATTERNED MEDIA; BIT-PATTERNED MEDIA (BPM); DIRECTED SELF-ASSEMBLY; INTEGRATION SCHEME; LOW DEFECT DENSITIES; MANUFACTURING ENVIRONMENTS; NOVEL STRATEGIES; TEMPLATE FABRICATION;

NANOIMPRINT LITHOGRAPHY;

EID: 84927161300     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/25/39/395301     Document Type: Article

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