The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

Thin Solid Films

Volumn 582, Issue , 2015, Pages 323-327

  Lisco, F ^a   Kaminski, P M ^a   Abbas, A ^a   Bass, K ^a   Bowers, J W ^a   Claudio, G ^a   Losurdo, M ^b   Walls, J M ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^b CNR   (Italy)

Author keywords

Cadmium sulphide; Chemical bath deposition; Film uniformity; Pinhole free films; Pulsed direct current magnetron sputtering; Thin films; Void free films

Indexed keywords

CADMIUM SULFIDE; CRYSTALLINITY; DEPOSITION RATES; ENERGY GAP; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; MORPHOLOGY; NANOCOMPOSITES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SULFUR COMPOUNDS; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL-BATH DEPOSITION; FLUORINE DOPED TIN OXIDE; FREE FILMS; MORPHOLOGICAL PROPERTIES; PULSED DC MAGNETRON SPUTTERING; PULSED DIRECT CURRENT; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; VOID-FREE;

THIN FILMS;

EID: 84926466572     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.11.062     Document Type: Conference Paper

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