AFM, XPS and RBS studies of the growth process of CdS thin films on ITO/glass substrates deposited using an ammonia-free chemical process

Applied Surface Science

Volumn 256, Issue 13, 2010, Pages 4280-4287

  Mazon Montijo D A ^a   Sotelo Lerma, M ^a   Rodriguez Fernandez L ^b   Huerta, L ^c  

^a UNIVERSIDAD DE SONORA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

Author keywords

Ammonia free; Cadmium hydroxide; Cadmium sulphide; Chemical bath deposition; Semiconductor thin films; X ray photoelectron spectroscopy

Indexed keywords

AMMONIA; ATOMIC FORCE MICROSCOPY; CADMIUM SULFIDE; DEPOSITION; II-VI SEMICONDUCTORS; IMPURITIES; ITO GLASS; LIGHT TRANSMISSION; OPTOELECTRONIC DEVICES; PHOTOELECTRONS; PHOTONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING CADMIUM COMPOUNDS; SUBSTRATES; SULFUR COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CADMIUM HYDROXIDE; CHEMICAL-BATH DEPOSITION; HEXAGONAL STRUCTURES; ITO/GLASS SUBSTRATES; MORPHOLOGICAL CHARACTERIZATION; NUCLEATION CENTER; RUTHERFORD BACKSCATTERING SPECTROMETRY; SEMICONDUCTOR THIN FILMS;

THIN FILMS;

EID: 77950520542     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.015     Document Type: Article

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