Resolution and alignment accuracy of low-temperature in situ electron beam lithography for nanophotonic device fabrication

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

Volumn 33, Issue 2, 2015, Pages

  Gschrey, Manuel ^a   Schmidt, Ronny ^a   Schulze, Jan Hindrik ^a   Strittmatter, André ^a   Rodt, Sven ^a   Reitzenstein, Stephan ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; NANOCRYSTALS; NANOPHOTONICS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

ALIGNMENT ACCURACY; CATHODOLUMINESCENCE SPECTROSCOPY; FEATURE SIZES; LITHOGRAPHIC TECHNOLOGIES; LOW TEMPERATURES; NANOPHOTONIC DEVICES; OPTIMIZED PROCESS; QUANTUM DEVICE;

SEMICONDUCTOR QUANTUM DOTS;

EID: 84924967773     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4914914     Document Type: Article

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