In situ electron-beam lithography of deterministic single-quantum-dot mesa-structures using low-temperature cathodoluminescence spectroscopy

Applied Physics Letters

Volumn 102, Issue 25, 2013, Pages

  Gschrey, M ^a   Gericke, F ^a   Schußler A ^a   Schmidt, R ^a   Schulze, J H ^a   Heindel, T ^a   Rodt, S ^a   Strittmatter, A ^a   Reitzenstein, S ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODOLUMINESCENCE; ELECTRON BEAMS; GALLIUM ALLOYS; INDIUM ALLOYS; NANOCRYSTALS; PHOTOLUMINESCENCE SPECTROSCOPY; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR ALLOYS; SEMICONDUCTOR QUANTUM DOTS; TEMPERATURE;

CATHODOLUMINESCENCE SPECTROSCOPY; DETERMINISTICS; ELECTRON-BEAM LITHOGRAPHY; FABRICATION METHOD; LITHOGRAPHY PROCESS; LOWS-TEMPERATURES; MESA STRUCTURE; SINGLE QUANTUM DOT; SPECTRAL FEATURE; STEP LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 84879872412     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4812343     Document Type: Article

References (16)

1. A. J. Shields, Nat. Photonics 1, 215 (2007). 10.1038/nphoton.2007.46
2. S. Reitzenstein, IEEE J. Sel. Top. Quantum Electron. 18, 1733 (2012). 10.1109/JSTQE.2012.2195159
3. O. G. Schmidt, Lateral Alignment of Epitaxial Quantum Dots (Springer, Berlin, 2007).
4. C. Schneider, M. Strauß, T. Sünner, A. Huggenberger, D. Wiener, S. Reitzenstein, M. Kamp, S. Höfling, and A. Forchel, Appl. Phys. Lett. 92, 183101 (2008). 10.1063/1.2920189
5. C. Schneider, A. Huggenberger, T. Sünner, T. Heindel, M. Strauß, S. Göpfert, P. Weinmann, S. Reitzenstein, L. Worschech, M. Kamp, Nanotechnology 20, 434012 (2009). 10.1088/0957-4484/20/43/434012
6. J. Skiba-Szymanska, A. Jamil, I. Farrer, M. B. Ward, C. A. Nicoll, D. J. P. Ellis, J. P. Griffiths, D. Anderson, G. A. C. Jones, D. A. Ritchie, Nanotechnology 22, 065302 (2011). 10.1088/0957-4484/22/6/065302
7. K. D. Jöns, P. Atkinson, M. Müller, M. Heldmaier, S. M. Ulrich, O. G. Schmidt, and P. Michler, Nano Lett. 13 (1), 126 (2012). 10.1021/nl303668z
8. A. Strittmatter, A. Schliwa, J.-H. Schulze, T. D. Germann, A. Dreismann, O. Hitzemann, E. Stock, I. A. Ostapenko, S. Rodt, W. Unrau, Appl. Phys. Lett. 100, 093111 (2012). 10.1063/1.3691251
9. W. Unrau, D. Quandt, J.-H. Schulze, T. Heindel, T. D. Germann, O. Hitzemann, A. Strittmatter, S. Reitzenstein, U. Pohl, and D. Bimberg, Appl. Phys. Lett. 101, 211119 (2012). 10.1063/1.4767525
10. F. Albert, S. Stobbe, C. Schneider, T. Heindel, S. Reitzenstein, S. Höfling, P. Lodahl, L. Worschech, and A. Forchel, Appl. Phys. Lett. 96, 151102 (2010). 10.1063/1.3393988
11. A. Dousse, L. Lanco, J. Suffczyński, E. Semenova, A. Miard, A. Lemaître, I. Sagnes, C. Roblin, J. Bloch, and P. Senellart, Phys. Rev. Lett. 101, 267404 (2008). 10.1103/PhysRevLett.101.267404
12. F. Donatini and L. S. Dang, Nanotechnology 21, 375303 (2010). 10.1088/0957-4484/21/37/375303
13. T. Kojima, K. Kojima, T. Asano, and S. Noda, Appl. Phys. Lett. 102, 011110 (2013). 10.1063/1.4773882
14. V. Türck, S. Rodt, R. Heitz, O. Stier, M. Straßburg, U. W. Pohl, and D. Bimberg, Physica E 13, 269 (2002). 10.1016/S1386-9477(01)00535-5
15. M. Bayer and A. Forchel, Phys. Rev. B 65, 041308 (2002). 10.1103/PhysRevB.65.041308
16. S. Rodt, A. Schliwa, K. Pötschke, F. Guffarth, and D. Bimberg, Phys. Rev. B 71, 155325 (2005). 10.1103/PhysRevB.71.155325