Study of high-resolution electron-beam resists for applications in low-temperature lithography

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

Volumn 32, Issue 6, 2014, Pages

  Gschrey, Manuel ^a   Schmidt, Ronny ^a   Kaganskiy, Arsenty ^a   Rodt, Sven ^a   Reitzenstein, Stephan ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONIZATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; LITHOGRAPHY; TEMPERATURE;

CARBONIZATION PROCESS; ELECTRON BEAM RESIST; HYDROGEN SILSESQUIOXANE; LOW TEMPERATURES; NETWORK FORMATION; QUANTUM DEVICE PROCESSING; ROOM TEMPERATURE; VOLATILE REACTIONS;

IN SITU PROCESSING;

EID: 84949114870     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4896671     Document Type: Article

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