Direct growth of nanocrystalline hexagonal boron nitride films on dielectric substrates

Applied Physics Letters

Volumn 106, Issue 10, 2015, Pages

  Tay, Roland Yingjie ^a,b   Tsang, Siu Hon ^b   Loeblein, Manuela ^a,c   Chow, Wai Leong ^a,c   Loh, Guan Chee ^d,e   Toh, Joo Wah ^a   Ang, Soon Loong ^a   Teo, Edwin Hang Tong ^a,f  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c RESEARCH TECHNO PLAZA   (Singapore)

^d INSTITUTE OF HIGH PERFORMANCE COMPUTING   (Singapore)

^e MICHIGAN TECHNOLOGICAL UNIVERSITY   (United States)

^f NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON NITRIDE; CATALYSTS; CHEMICAL VAPOR DEPOSITION; CRYSTALLITE SIZE; DIELECTRIC MATERIALS; FILM GROWTH; NANOCRYSTALS; NITRIDES; QUARTZ; THIN FILMS; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

AS-GROWN THIN FILMS; CATALYTIC TRANSITION METALS; CHEMICAL VAPOR DEPOSITIONS (CVD); COATING APPLICATION; DIELECTRIC SUBSTRATES; HEXAGONAL BORON NITRIDE (H-BN); HEXAGONAL BORON NITRIDE FILMS; LARGE-SCALE MANUFACTURING;

SUBSTRATES;

EID: 84924405818     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4914474     Document Type: Article

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