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Volumn 2, Issue 9, 2014, Pages 1650-1657

A systematic study of the atmospheric pressure growth of large-area hexagonal crystalline boron nitride film

(8) Tay, Roland Yingjie a,b Wang, Xingli a Tsang, Siu Hon b Loh, Guan Chee c,d Singh, Ram Sevak a Li, Hong a Mallick, Govind b,e Tong Teo, Edwin Hang a,f

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c INSTITUTE OF HIGH PERFORMANCE COMPUTING (Singapore)

d MICHIGAN TECHNOLOGICAL UNIVERSITY (United States)

e U S ARMY RESEARCH LABORATORY (United States)

f NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; AVERAGE DOMAIN SIZE; BORON NITRIDE FILMS; CONTROLLABLE GROWTH; CRUCIAL PARAMETERS; HEXAGONAL BORON NITRIDE (H-BN); HEXAGONAL CRYSTALLINE; TWO DIMENSIONAL (2D) ELECTRONICS;

ATMOSPHERIC PRESSURE; BORON NITRIDE; CHEMICAL VAPOR DEPOSITION; GROWTH TEMPERATURE;

FILM GROWTH;

EID: 84893838829 PISSN: 20507534 EISSN: 20507526 Source Type: Journal
DOI: 10.1039/c3tc32011a Document Type: Article

Times cited : (77)

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